High Temperature Rapid Thermal Annealing System HT-RTA59HD

This desktop ultra-high temperature annealing system achieves high reflection efficiency by heating in a focused manner precious materials like SiC and other small materials with high melting points and is capable of heating up to ultra-high temperature range of 1800 °C

 

 

Applications

• Oxide film formation in SiC(GaN) power device process, Research and development of activation annealing
• Research and development of semiconductor process
• Heat treatment of glass substrate, ceramics, composite materials etc.
• Thermal shock tests of ceramics materials
• Various heat treatment tests such as sintering of metal materials with high melting points
• Usable as a temperature gradient furnace
• Usable as a heating furnace for gas analysis

Features

• Capable of heating up to ultra-high temperature of 1800 °C in 10 seconds
• Spot focused furnace with high-power lamps built on ellipsoidal reflective surface
• Cold Wall enables rapid-heating & cooling and clean-heating
• Desktop type with a heating furnace integrated with a quartz chamber
• Easy input of temperature recipe through PC connected with USB
• Capable of displaying temperature data on PC screen during the heating (Saving data in a text file is also available.)

Specifications

Type HT-RTA59HD
Temperature range Room Temperature to 1800 °C (max. 2000 °C)
Sample size 15 mm square x 1 mm thickness
Temperature control sensor JIS thermocouple type B (W-Re is also available)
Power supply AC 200 V 40 A 8 kW
Cooling water 0.3MPa Approx 5L/min
Lamp cooling gas Dry air Approx 200L/min
Outside dimensions (mm) Approx W410 x D450 x H840 (excluding protrusion)
Weight Approx 45kg

 

 

System diagram

 For lamp cooling Air GAS INLET  GAS OUTLET  N2 GAS INLET  Ar GAS INLET

 Lamp  Transparent quartz protective tube  Sample

 Slider to move the sample into/out of the furnace (Manual operation)

 

Heating property

Maximum achieving temperature

The power supply                    7kW(max)
Measurement                           W-Re thermocouple
Heating atmosphere               N2 1L/min
Attainment Temperature      2157℃ (Approx 200℃/sec heating up to 2000℃)

 

 

Rapid heating control

Temperature recipe           200℃/s holding time 5 min.
Heating atmosphere         N2 100cc/mm
Sample holder                    High purity carbon
Sample Susceptor              High purity carbon

Sample holder and susceptor

Option

• Vacuum exhaust system (RP, DRY, TMP etc.)
• Gas piping system (From 2nd system)
• Cooling water circulator
• Cooling air generator system
• Handy spot welder (HS-9000)
• Handy arc welder (HA-1H)