Low-acceleration and High-density Ion Implanter SOPHI-30
SOPHI-30, cluster type low-acceleration and high-density ion implanter, has no mass separator and supports thin wafers.
- Cluster type
- Thin wafer compatible.
- No mass separator
1) High throughput ion implanter with low acceleration and high density
2) Half price as compared to conventional implanter
3) 1/3 the footprint of conventional implanter
- Power device manufacturing process, IGBT
- Wafer size: Up to 200mm