Perfect for research and development on small samples
Capable of high-speed heating, high-speed cooling, and clean heating. This small, low-cost Infrared Lamp Heating System combines a temperature controller and a variable atmosphere chamber, capable of heating in an adjustable atmosphere. Heating operations can be performed on a PC via a USB connection and data can be easily managed.
• 50 °C/s high-speed heating
• Selectable atmosphere: vacuum, gas, gas flow, air
• Precise temperature control
• Compact, table-top design
• Crystal annealing of ferroelectric thin films
• Diffusion annealing after ion implantation and oxide film generation annealing
• Sintering and alloying treatments of Si and compound wafers
• Burn annealing of glass substrates
• Thermal cycle, thermal shock, thermal fatigue tests
• Temperature-programmed desorption tests, catalytic effect tests
Type | MILA-5000-P-N (Near-infrared type) |
MILA-5000-P-F (Far-infrared type) |
---|---|---|
Temperature Range | RT to 1200 °C | RT to 800 °C |
Maximum heating rate ※ | 50℃/s(50℃~1200℃)in vacuum atmosphere 45℃/s(50℃~1200℃)in nitrogen gas |
4℃/s(50℃~800℃)in vacuum atmosphere 4℃/s(50℃~800℃)in nitrogen gas |
Temperature uniformity ※ | ±2.0℃(ΔT=4℃)at 1200℃ in vacuum atmosphere ±4.5℃(ΔT=9℃)at 1200℃ in nitrogen gas |
±1.8℃(ΔT=3.6℃)at 500℃ in vacuum atmosphere ±1.2℃(ΔT=2.4℃)at 500℃ in nitrogen gas |
Lamp | Near-infrared lamp | Far-infrared lamp |
Sample Size | 20 mm square x 2 mm thickness | |
Measurement Atmosphere | Air, Vacuum, Gas flow | |
Optional | Vacuum pumping equipment (rotary pump set) Cooling water circulation unit |
※The heating rate and temperature uniformity above are the measured values of a 20mm deep × 20mm wide × 0.5mm thick nickel plate.
※Subject to change depending on material and size.